Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

• Ulrich C. Fischer,
• Carsten Hentschel,
• Florian Fontein,
• Linda Stegemann,
• Christiane Hoeppener,
• Harald Fuchs and
• Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

• highly localized shadow. The removal of the gold mask reveals the SAM nanopattern. Keywords: colloid lithography; contact lithography; near-field; photochemistry; self-assembled silane monolayers; Introduction Chemical nanopatterns consist of spatially separated areas providing different chemically

• techniques based on self-assembly, such as colloidal sphere lithography (CL) [20][21][22], nanostructures extending over relatively large areas can be formed in a simple way. We demonstrated a new concept for the chemical fabrication of nanopatterns of self-assembled silane monolayers (SAM) with selective

• discussions with Rivka Maoz and Jakob Sagiv who also supported initial efforts in using self-assembled silane monolayers as substrates for near-field fabrication processes.